Ken Ozawa
Principal Engineer at Samsung R&D Institute Japan
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 11 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Etching, Reflectivity, Chromium, Scanning electron microscopy, Printing, Photomasks, Image enhancement, Semiconducting wafers, Binary data, Resolution enhancement technologies

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Polarization, Birefringence, Wave plates, Electroluminescence, Photomasks, Cadmium sulfide, Critical dimension metrology, Tolerancing, Lawrencium

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Lithographic illumination, Polarization, Birefringence, Error analysis, Electroluminescence, Photomasks, Immersion lithography, Tolerancing, Fiber optic illuminators

Proceedings Article | 29 March 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Semiconductors, Oxides, Lithography, Refractive index, Polarization, Silicon, Reflectivity, Photoresist materials, Immersion lithography, Optimization (mathematics)

Proceedings Article | 15 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Logic, Lithographic illumination, Polarization, Manufacturing, Imaging devices, Photomasks, Optical proximity correction, SRAF, Line edge roughness

Showing 5 of 14 publications
Conference Committee Involvement (2)
Optical Microlithography XXII
24 February 2009 | San Jose, California, United States
Optical Microlithography XXI
26 February 2008 | San Jose, California, United States
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