Kenichi Shiraishi
at Nikon Corp
SPIE Involvement:
Author
Publications (11)

PROCEEDINGS ARTICLE | March 10, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Reticles, Metrology, Interferometers, Sensors, Computer programming, Servomechanisms, Artificial intelligence, Double patterning technology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 10, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Atrial fibrillation, Polymers, Particles, Inspection, Scanning electron microscopy, Printing, Double patterning technology, Immersion lithography, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 17, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Particles, Coating, Materials processing, Inspection, Printing, Bridges, Photomasks, Immersion lithography, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Imaging systems, Sensors, Calibration, Scanners, Manufacturing, Control systems, Lens design, Immersion lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Optical lithography, Calibration, Particles, Inspection, Bridges, Wafer inspection, Immersion lithography, Photoresist processing, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | March 26, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithographic illumination, Polarization, Calibration, Scanners, Particles, Wavefront aberrations, Scanning electron microscopy, Bridges, Immersion lithography, Semiconducting wafers

Showing 5 of 11 publications
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