Kenichi Takenouchi
at Hitachi High Technologies
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Edge detection, Metrology, Environmental monitoring, Modulation, Silicon, Scanning electron microscopy, Objectives, Semiconductor manufacturing, Optical alignment, Local area networks

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Image compression, Video, Error analysis, Image resolution, Scanning electron microscopy, Video compression, Semiconductor manufacturing, Semiconducting wafers, Prototyping, RGB color model

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