Kenichiro Natsuda
at Osaka Univ
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 30 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Electron beams, FT-IR spectroscopy, Polymers, Chromium, Solids, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Absorption, Chemically amplified resists

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Polymers, Diffusion, Image quality, Solids, Extreme ultraviolet, Line edge roughness, Photoresist processing, Polymer thin films, Absorption, Chemically amplified resists

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