Dr. Kenji Hiruma
Senior Research Scientist at ASET
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 15 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Sputter deposition, Interfaces, Silicon, Reflectivity, Surface roughness, Atomic force microscopy, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Sputter deposition, Particles, Interfaces, Silicon, Reflectivity, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Molybdenum

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Transparency, Etching, Silicon, Inspection, Reflectivity, Atomic force microscopy, Printing, Photomasks, Extreme ultraviolet, Gallium

Proceedings Article | 23 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Argon, Chemical species, Sputter deposition, Interfaces, Silicon, Reflectivity, Transmission electron microscopy, Ion beams, Extreme ultraviolet, Molybdenum

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