Dr. Kenji Honda
Technical Director at Toshiba Corp
SPIE Involvement:
Author
Publications (12)

PROCEEDINGS ARTICLE | March 13, 2015
Proc. SPIE. 9403, Image Sensors and Imaging Systems 2015
KEYWORDS: Signal to noise ratio, Optical filters, CMOS sensors, Sensors, Metals, Silicon, Quantum efficiency, Signal processing, Ion implantation, Signal detection

PROCEEDINGS ARTICLE | May 3, 2004
Proc. SPIE. 5379, Design and Process Integration for Microelectronic Manufacturing II
KEYWORDS: Logic, Diffractive optical elements, Metals, Resistance, Scanning electron microscopy, Very large scale integration, Photomasks, Optical proximity correction, Structural design, Back end of line

PROCEEDINGS ARTICLE | July 24, 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Polymers, Spectroscopy, Ultraviolet radiation, Silicon, Photoresist materials, Polymerization, Semiconducting wafers, Information operations, Chemically amplified resists

PROCEEDINGS ARTICLE | July 24, 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Transparency, Etching, Polymers, Resistance, Carbonates, Photoresist materials, Absorbance, Systems modeling, Plasma

PROCEEDINGS ARTICLE | August 24, 2001
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Lithography, Deep ultraviolet, Polymers, Image processing, Chemistry, Carbonates, Photoresist materials, Photomasks, Line edge roughness, Binary data

PROCEEDINGS ARTICLE | May 16, 1994
Proc. SPIE. 2195, Advances in Resist Technology and Processing XI
KEYWORDS: Carbon, Calibration, Spectroscopy, Molecules, Hydrogen, Infrared spectroscopy, Deconvolution, Absorbance, Molecular interactions, Absorption

Showing 5 of 12 publications
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