Kenji Hoshiko
at JSR Micro NV
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 6 April 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Semiconductors, Lithography, Optical lithography, Chemical species, Diffusion, Extreme ultraviolet, Line width roughness, Semiconductor manufacturing, Extreme ultraviolet lithography, Chemically amplified resists

Proceedings Article | 20 March 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Polymers, Photons, Electrons, Photoresist materials, Extreme ultraviolet lithography, Synchrotrons, Fluorine, Semiconducting wafers, Stochastic processes, Absorption

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Chemical species, Diffusion, Extreme ultraviolet, Line width roughness, Absorbance, Extreme ultraviolet lithography, Line edge roughness, Fluorine, Semiconducting wafers

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Metrology, Scanners, Computer simulations, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Photoresist processing, Stochastic processes

Proceedings Article | 31 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Reticles, Optical lithography, Sensors, Scanning electron microscopy, Signal processing, Double patterning technology, Optical alignment, Photoresist processing, Semiconducting wafers

Showing 5 of 9 publications
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