Mr. Kenji Hosoi
at Central Glass Co Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | April 18, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Polymers, Glasses, Photoresist materials, Solids, Polymerization, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Sodium

PROCEEDINGS ARTICLE | March 20, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Polymers, Amplifiers, Photoresist materials, Polymerization, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Fluorine, Temperature metrology

PROCEEDINGS ARTICLE | March 20, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Neck, Lithography, Polymers, Glasses, Molecules, Diffusion, Amplifiers, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness

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