Kenji Kawano
at Toshiba
SPIE Involvement:
Author
Publications (12)

SPIE Journal Paper | 1 January 2009
JM3 Vol. 8 Issue 01
KEYWORDS: Data modeling, Line width roughness, Critical dimension metrology, Nanoimprint lithography, Lithography, Process modeling, Optical lithography, Lithographic illumination, Semiconducting wafers, Inspection

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Optical lithography, Opacity, Etching, Materials processing, Photomasks, Line width roughness, Double patterning technology, Photoresist processing, Semiconducting wafers

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Data modeling, Inspection, Line width roughness, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Process modeling

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Surface plasmons, Optical lithography, Etching, Photomasks, Line width roughness, Double patterning technology, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Point spread functions, Data modeling, Light scattering, Photoresist materials, Photomasks, Double patterning technology, Critical dimension metrology, Semiconducting wafers, Magnetorheological finishing, Photoresist developing

Showing 5 of 12 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top