Mr. Kenji Konomi
at Toshiba Corp
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Error analysis, Inspection, Feature extraction, Scanning electron microscopy, Photomasks, Mask making, Computer aided design, Quality systems, Semiconducting wafers

PROCEEDINGS ARTICLE | March 17, 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Lithography, Data modeling, Image processing, Computer simulations, Photomasks, Logic devices, Optical proximity correction, Semiconducting wafers, Process modeling, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Semiconductors, Diffraction, Monochromatic aberrations, Light sources, Image acquisition, Lens design, Scanning electron microscopy, SRAF, Critical dimension metrology, Semiconducting wafers

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