Kenji Konomi
at Toshiba Corp
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Error analysis, Inspection, Feature extraction, Scanning electron microscopy, Photomasks, Mask making, Computer aided design, Quality systems, Semiconducting wafers

Proceedings Article | 17 March 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Lithography, Data modeling, Image processing, Computer simulations, Photomasks, Logic devices, Optical proximity correction, Semiconducting wafers, Process modeling, Resolution enhancement technologies

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Semiconductors, Diffraction, Monochromatic aberrations, Light sources, Image acquisition, Lens design, Scanning electron microscopy, SRAF, Critical dimension metrology, Semiconducting wafers

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top