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Kenji Masui
at Toshiba Corp
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 12 June 2018 Paper
Fabrication of Ta based absorber EUV mask with SRAF
Proceedings Volume 10807, 108070F (2018) https://doi.org/10.1117/12.2503150
KEYWORDS: Photomasks, Line width roughness, Extreme ultraviolet, SRAF, Extreme ultraviolet lithography, Tantalum, Scanning electron microscopy, Chromium
Proceedings Article | 19 May 2008 Paper
Application of two-fluid nozzles for advanced photomask cleaning process
Kenji Masui, Tetsuo Takemoto, Kyo Otsubo, Mari Sakai, Tomotaka Higaki, Hidehiro Watanabe, Tsutomu Kikuchi, Yoshiaki Kurokawa
Proceedings Volume 7028, 702809 (2008) https://doi.org/10.1117/12.793018
KEYWORDS: Particles, Photomasks, Mask cleaning, Liquids, Mechatronics, Velocity measurements, Phase measurement, Cavitation, Quartz
Proceedings Article | 19 July 2000 Paper
Mask cleaner innovation
Hidehiro Watanabe, Kenji Masui, Akio Kosaka, Naoya Hayamizu, Akinori Iso, Hachiro Hiratsuka, Yoshiaki Minegishi, Fumiaki Shigemitsu
Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392045
KEYWORDS: Photomasks, Ultraviolet radiation, Particles, Mask cleaning, Contamination, Mechatronics, Control systems, Semiconductors, Process engineering, Inspection
Proceedings Article | 1 September 1998 Paper
Ultrafine mask cleaning technology using ultraviolet irradiation
Kenji Masui, Akio Kosaka, Hiroishi Fujita, Hidehiro Watanabe
Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328830
KEYWORDS: Ultraviolet radiation, Chromium, Photomasks, Contamination, Particles, Mask cleaning, Etching, Oxides, Mercury, Pulsed laser operation
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