Kenji Ohtoshi
General Manager of Mask Lithography at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (16)

SPIE Journal Paper | September 24, 2018
JM3 Vol. 17 Issue 03
KEYWORDS: Modulation, Photomasks, Optical lithography, Critical dimension metrology, Image resolution, Line edge roughness, Photoresist processing, Electron beam lithography, Vestigial sideband modulation, Convolution

PROCEEDINGS ARTICLE | June 12, 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Electron beam lithography, Electron beams, Optical lithography, Photomasks, Photoresist processing

PROCEEDINGS ARTICLE | April 5, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Electron beam lithography, Electron beams, Optical lithography, Modulation, Image resolution, Photomasks, Beam shaping, Convolution, Photoresist processing, Vestigial sideband modulation

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Modulation, Data processing, Photomasks, Computer aided design

PROCEEDINGS ARTICLE | September 28, 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Modulation, Data storage, Image processing, Interfaces, Data processing, Relays, Photomasks, Data conversion, Photoresist processing, Vestigial sideband modulation

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Semiconductors, Optical design, Modulation, Data storage, Data processing, Relays, Photomasks, Extreme ultraviolet lithography, High volume manufacturing, Vestigial sideband modulation

Showing 5 of 16 publications
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