Dr. Kenji Yamazoe
at TSMC North America
SPIE Involvement:
Conference Program Committee | Author
Publications (14)

Proceedings Article | 19 May 2011 Paper
Andrew Neureuther, Juliet Rubinstein, Marshal Miller, Kenji Yamazoe, Eric Chin, Cooper Levy, Lynn Wang, Nuo Xu, Costas Spanos, Kun Qian, Kameshwar Poolla, Justin Ghan, Anand Subramanian, Tsu-Jae King Liu, Xin Sun, Kwangok Jeong, Puneet Gupta, Abde Kaqalwalla, Rani Ghaida, Tuck Boon Chan
Proceedings Volume 8081, 80810N (2011) https://doi.org/10.1117/12.899394
KEYWORDS: Photomasks, Double patterning technology, Lithography, Image processing, Line edge roughness, Algorithm development, Reticles, Inspection, Design for manufacturing, Device simulation

Proceedings Article | 8 April 2011 Paper
Proceedings Volume 7969, 79691X (2011) https://doi.org/10.1117/12.881652
KEYWORDS: Reconstruction algorithms, Extreme ultraviolet, Atomic force microscopy, Photomasks, Inspection, Algorithm development, Computer simulations, Microscopes, Phase measurement, Imaging systems

Proceedings Article | 10 March 2010 Paper
Proceedings Volume 7640, 764031 (2010) https://doi.org/10.1117/12.846630
KEYWORDS: Photomasks, Composites, Convolution, Polarization, Monochromatic aberrations, Lithography, Electromagnetism, Calibration, Binary data, Detection and tracking algorithms

Proceedings Article | 4 March 2010 Paper
Proceedings Volume 7640, 76400N (2010) https://doi.org/10.1117/12.846666
KEYWORDS: Diffraction, Matrices, Image acquisition, Principal component analysis, Imaging systems, Coherence imaging, Fourier transforms, System on a chip, Coherence (optics), Light sources

Proceedings Article | 30 September 2009 Paper
Proceedings Volume 7488, 74883H (2009) https://doi.org/10.1117/12.829657
KEYWORDS: Photomasks, Composites, Monochromatic aberrations, Fourier transforms, Lithography, Zernike polynomials, Airborne remote sensing, Polarization, Electromagnetism, Semiconducting wafers

Showing 5 of 14 publications
Conference Committee Involvement (4)
Optical and EUV Nanolithography XXXVIII
23 February 2025 | San Jose, California, United States
Optical and EUV Nanolithography XXXVII
26 February 2024 | San Jose, California, United States
Optical and EUV Nanolithography XXXVI
27 February 2023 | San Jose, California, United States
Optical and EUV Nanolithography XXXV
25 April 2022 | San Jose, California, United States
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