Dr. Kenji Yamazoe
at TSMC
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 19 May 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Lithography, Reticles, Image processing, Inspection, Design for manufacturing, Photomasks, Double patterning technology, Line edge roughness, Algorithm development, Device simulation

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Microscopes, Imaging systems, Inspection, Computer simulations, Atomic force microscopy, Photomasks, Extreme ultraviolet, Reconstruction algorithms, Phase measurement, Algorithm development

Proceedings Article | 10 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Monochromatic aberrations, Detection and tracking algorithms, Polarization, Calibration, Composites, Photomasks, Convolution, Electromagnetism, Binary data

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Diffraction, Coherence imaging, Light sources, Principal component analysis, Coherence (optics), Imaging systems, Matrices, Fourier transforms, Image acquisition, System on a chip

Proceedings Article | 30 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Monochromatic aberrations, Polarization, Composites, Fourier transforms, Zernike polynomials, Photomasks, Semiconducting wafers, Electromagnetism, Airborne remote sensing

SPIE Journal Paper | 1 July 2009
JM3 Vol. 8 Issue 03
KEYWORDS: Fourier transforms, Linear filtering, Image transmission, Resolution enhancement technologies, Computer simulations, Phase shifting, Photomasks, Binary data, Coherence imaging, Lithography

Showing 5 of 14 publications
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