Dr. Goldberg is an Optical Physicist and Staff Scientist at Lawrence Berkeley National Laboratory (LBNL), where he leads the Advanced Light Source (ALS) Photon Science Development Group. He specializes in the development of short-wavelength optical technologies for x-ray beamlines including interferometric testing, mirrors and adaptive optics for high coherent flux, diffractive optics, and diagnostics.
From 1993-2017, with LBNL’s Center for X-Ray Optics (CXRO) Goldberg developed experimental systems to advance extreme ultraviolet (EUV) photolithography research–optics, resists, and photomasks–leading ultimately to its commercialization.
In 2016 Goldberg joined the Advanced Light Source Upgrade project to create a diffraction-limited storage ring. He led the beamlines and optical systems portion of the project through the conceptual and preliminary design phases.
Goldberg’s group now develops beamline optical designs, gratings, metrology, fast detectors, controls, advanced computing, endstations, sample environments, and more.
Goldberg’s work provided pioneering demonstrations and advances in EUV and x-ray optics, imaging, and the control of light at nanometer scales. He has been CXRO Deputy Director and the PI and Co-PI of numerous projects including US DOE-funded collaborations and projects sponsored by semiconductor industry partners.
He served four years as conference chair for EUV Lithography at the SPIE Advanced Lithography conference and three years on the conference (now ALP) Advisory Committee.
Goldberg received an A.B. degree in Physics and Applied Mathematics and a Ph.D. in Physics from U.C. Berkeley. He has won the Halbach Prize for Instrumentation, shared an R&D 100 award, and received two best oral presentation awards from international conferences. He was elected an Optica Fellow and an SPIE Senior Member in 2021. He has received 13 patents (8 as first author) and has over one hundred journal publications and ~130 SPIE publications.
From 1993-2017, with LBNL’s Center for X-Ray Optics (CXRO) Goldberg developed experimental systems to advance extreme ultraviolet (EUV) photolithography research–optics, resists, and photomasks–leading ultimately to its commercialization.
In 2016 Goldberg joined the Advanced Light Source Upgrade project to create a diffraction-limited storage ring. He led the beamlines and optical systems portion of the project through the conceptual and preliminary design phases.
Goldberg’s group now develops beamline optical designs, gratings, metrology, fast detectors, controls, advanced computing, endstations, sample environments, and more.
Goldberg’s work provided pioneering demonstrations and advances in EUV and x-ray optics, imaging, and the control of light at nanometer scales. He has been CXRO Deputy Director and the PI and Co-PI of numerous projects including US DOE-funded collaborations and projects sponsored by semiconductor industry partners.
He served four years as conference chair for EUV Lithography at the SPIE Advanced Lithography conference and three years on the conference (now ALP) Advisory Committee.
Goldberg received an A.B. degree in Physics and Applied Mathematics and a Ph.D. in Physics from U.C. Berkeley. He has won the Halbach Prize for Instrumentation, shared an R&D 100 award, and received two best oral presentation awards from international conferences. He was elected an Optica Fellow and an SPIE Senior Member in 2021. He has received 13 patents (8 as first author) and has over one hundred journal publications and ~130 SPIE publications.
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