Dr. Kenneth A. Goldberg
Staff Physicist at Lawrence Berkeley National Lab
SPIE Involvement:
Conference Program Committee | Author | Editor
Area of Expertise:
EUV optics , microscopy , x-ray optics , interferometry , photomasks , optical modeling
Profile Summary

Dr. Kenneth Goldberg is an optical physicist developing advanced beamlines and optical systems for high-coherent-flux, x-ray beamlines, with diffraction limited performance. Dr. Goldberg now serves on the team developing experimental systems for the Advanced Light Source Upgrade project at Lawrence Berkeley National Laboratory. The project is developing new and upgraded beamlines for coherent soft x-ray and tender x-ray science.

He is formerly the Deputy Directory of LBNL's Center for X-Ray Optics, and the Principal Investigator of the SHARP EUV mask-imaging microscope, and the Actinic Inspection Tool (AIT), and was a co-creator of the SEMATECH Berkeley Micro-Exposure Tool (MET).

Dr. Goldberg specializes in the development of short-wavelength optical technologies for including mirrors and novel diffractive optics, including zone plates, photolithography instrumentation, beam diagnostics and mask imaging. He has a career-long obsession with wavefront-measuring interferometry.

Dr. Goldberg received an A.B. degree in Physics and Applied Math, and a Ph.D. in Physics from the University of California, Berkeley. He has authored and co-authored over 300 publications, and has received 13 patents. Dr. Goldberg served as chairman of the Advanced Light Source Users Executive Committee (ALS UEC) in 2009, representing a community of over 2000 synchrotron users. He was the Experimental Systems program chair of the 6th International Workshop of Diffraction-Limited Storage Rings. He served four years as chair and co-chair of the SPIE Advanced Lithography's EUV Lithography conference.
Publications (121)

Proceedings Article | 9 September 2019
Proc. SPIE. 11109, Advances in Metrology for X-Ray and EUV Optics VIII
KEYWORDS: Diffraction, Monochromatic aberrations, Mirrors, Sensors, Crystals, X-rays, Wavefront sensors, Wavefronts, Adaptive optics, Optical alignment, Hard x-rays

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Microscopes, Diffraction, Mirrors, Sensors, Image sensors, Photomasks, Extreme ultraviolet, Charge-coupled devices, CCD image sensors, Fiber optic illuminators

Proceedings Article | 17 September 2018
Proc. SPIE. 10760, Advances in X-Ray/EUV Optics and Components XIII
KEYWORDS: Diffraction, Cameras, Sensors, Calibration, X-rays, Scintillators, Interferometry, Wavefront sensors, Wavefronts, Diffraction gratings

Proceedings Article | 29 May 2018
Proc. SPIE. 10656, Image Sensing Technologies: Materials, Devices, Systems, and Applications V
KEYWORDS: Microscopes, Light sources, Optical lithography, Lithographic illumination, Inspection, Reflectivity, Data acquisition, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 15 May 2018
Proc. SPIE. 10669, Computational Imaging III
KEYWORDS: Microscopes, Manufacturing, Reflectivity, Image resolution, Phase retrieval, Phase imaging, Extreme ultraviolet

Showing 5 of 121 publications
Proceedings Volume Editor (5)

SPIE Conference Volume | 17 June 2019

SPIE Conference Volume | 22 May 2018

SPIE Conference Volume | 18 May 2017

SPIE Conference Volume | 7 July 2016

SPIE Conference Volume | 23 November 1999

Conference Committee Involvement (15)
Extreme Ultraviolet (EUV) Lithography XII
21 February 2021 | San Jose, California, United States
Advances in Metrology for X-Ray and EUV Optics IX
23 August 2020 | San Diego, California, United States
Extreme Ultraviolet (EUV) Lithography XI
24 February 2020 | San Jose, California, United States
Advances in Metrology for X-Ray and EUV Optics VIII
11 August 2019 | San Diego, California, United States
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Showing 5 of 15 Conference Committees
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