Dr. Kenneth A. Goldberg
ALS-Upgrade Beamlines and Optical System Lead at Lawrence Berkeley National Lab.
SPIE Involvement:
Conference Program Committee | Conference Chair | Conference Co-Chair | Author | Editor
Area of Expertise:
EUV optics , microscopy , x-ray optics , interferometry , photomasks , optical modeling
Profile Summary

Dr. Kenneth Goldberg is an optical physicist and the leader of the Advanced Light Source Upgrade (ALS-U) Beamlines and Optical Systems Group at Lawrence Berkeley National Laboratory (LBNL). ALS-U is a project to create a synchrotron light source diffraction-limited into the tender x-ray energy range. He is formerly the Deputy Directory of LBNL's Center for X-Ray Optics, and the Principal Investigator of the SHARP EUV mask imaging microscope, and the Actinic Inspection Tool (AIT), and was a co-creator of the SEMATECH Berkeley Micro-Exposure Tool (MET).

Dr. Goldberg specializes in the development of technologies for EUV and soft x-ray wavelengths, including optical systems, photolithography instrumentation, mask imaging, and wavefront-measuring interferometry. Dr. Goldberg received an A.B. degree in Physics and Applied Math, and a Ph.D. in Physics from the University of California, Berkeley. He has authored and co-authored over 250 publications, and has received 13 patents. Dr. Goldberg served as chairman of the Advanced Light Source Users Executive Committee (ALS UEC) in 2009, representing a community of over 2000 synchrotron users.

He is currently the Co-Chairman of the SPIE Advanced Lithography EUV Lithography conference.
Publications (130)

PROCEEDINGS ARTICLE | September 17, 2018
Proc. SPIE. 10760, Advances in X-Ray/EUV Optics and Components XIII
KEYWORDS: Diffraction, Cameras, Sensors, Calibration, X-rays, Scintillators, Interferometry, Wavefront sensors, Wavefronts, Diffraction gratings

PROCEEDINGS ARTICLE | May 29, 2018
Proc. SPIE. 10656, Image Sensing Technologies: Materials, Devices, Systems, and Applications V
KEYWORDS: Microscopes, Light sources, Optical lithography, Lithographic illumination, Inspection, Reflectivity, Data acquisition, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

SPIE Conference Volume | May 22, 2018

PROCEEDINGS ARTICLE | May 15, 2018
Proc. SPIE. 10669, Computational Imaging III
KEYWORDS: Microscopes, Manufacturing, Reflectivity, Image resolution, Phase retrieval, Phase imaging, Extreme ultraviolet

PROCEEDINGS ARTICLE | October 27, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Microscopes, Reticles, Modulation, Imaging systems, Lenses, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Microscopes, Optical lithography, Image segmentation, Reflectivity, Image analysis, 3D metrology, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Showing 5 of 130 publications
Conference Committee Involvement (13)
Advances in Metrology for X-Ray and EUV Optics VIII
11 August 2019 | San Diego, California, United States
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Advances in Metrology for X-Ray and EUV Optics VII
6 August 2017 | San Diego, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Showing 5 of 13 published special sections
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