Photocurable, liquid perfluoropolyethers (PFPEs) are ideal materials for high resolution (<100 nm) pattern transfer and imprint lithographic processes. PFPEs possess attributes of both elastomers and rigid materials, exhibit a remarkably low surface energy, mold extremely small features with high fidelity (minimal shrinkage), resist swelling by most organics, endure repetitive molding procedures, and out-perform routinely-used polydimethylsiloxane when replicating sub-micron sized features. We report nanoscale replicas of substrates, and the use of these replicas as molds, having features as small as 70 nm with no apparent loss of resolution.
Conference Committee Involvement (5)
Novel Patterning Technologies 2018
26 February 2018 | San Jose, California, United States
Emerging Patterning Technologies 2017
27 February 2017 | San Jose, California, United States
Alternative Lithographic Technologies VIII
22 February 2016 | San Jose, California, United States
Alternative Lithographic Technologies VII
23 February 2015 | San Jose, California, United States
Alternative Lithographic Technologies VI
24 February 2014 | San Jose, California, United States
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