Kenneth Jantzen
at Mentor Graphics Corp
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 16 October 2019 Presentation + Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Data modeling, Opacity, Calibration, Etching, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

SPIE Journal Paper | 28 April 2015
JM3 Vol. 14 Issue 02
KEYWORDS: Scanning electron microscopy, Optical proximity correction, Calibration, Electron microscopes, Critical dimension metrology, Data modeling, Metrology, Performance modeling, Model-based design, Cadmium

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Semiconductors, Visualization, Manufacturing, Data processing, Photomasks, Integrated circuits, Optical proximity correction, Back end of line, Front end of line, Design for manufacturability

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Optical lithography, Data modeling, Calibration, Etching, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Statistical modeling, Performance modeling

Proceedings Article | 31 March 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Metrology, Cadmium, Data modeling, Calibration, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Statistical modeling, Performance modeling

Showing 5 of 11 publications
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