Dr. Kenny Toh
Principal Engineer at Intel
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Optical lithography, Cadmium, Modulation, Etching, Glasses, Image transmission, Photomasks, SRAF, Semiconducting wafers, Phase shifts

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Optical lithography, Glasses, Manufacturing, Image quality, Photomasks, Computational lithography, Optical proximity correction, Optimization (mathematics), Semiconducting wafers

Proceedings Article | 26 July 1999
Proc. SPIE. 3679, Optical Microlithography XII
KEYWORDS: Lithography, Monochromatic aberrations, Light sources, Reticles, Lithographic illumination, Distortion, Image quality, Photomasks, Spherical lenses, Fiber optic illuminators

Proceedings Article | 1 June 1992
Proc. SPIE. 1674, Optical/Laser Microlithography V
KEYWORDS: Lithography, Transparency, Optical lithography, Scanning electron microscopy, Printing, Photoresist materials, Photomasks, Photoresist processing, Stereolithography, Photoresist developing

Proceedings Article | 1 July 1991
Proc. SPIE. 1463, Optical/Laser Microlithography IV
KEYWORDS: Optical lithography, Opacity, Phase shift keying, Scanning electron microscopy, Photoresist materials, Photomasks, Photoresist processing, Semiconducting wafers, Destructive interference, Phase shifts

Showing 5 of 8 publications
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