Kensuke Tsuchiya
at Sony Corp
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | May 15, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Semiconductors, Lithography, Image processing, Photomasks, Optical proximity correction, Critical dimension metrology, Photoresist processing, Optical calibration, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 14, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Metals, Image processing, Error analysis, Manufacturing, Design for manufacturing, Photomasks, Optical proximity correction, Failure analysis, Yield improvement

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Semiconductors, Lithography, Image processing, Scanning electron microscopy, Printing, Photomasks, Optical proximity correction, SRAF, Model-based design, Resolution enhancement technologies

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Semiconductors, Lithography, Metals, Scanners, Printing, Design for manufacturing, Photomasks, Optical proximity correction, SRAF, Design for manufacturability

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Electron beam lithography, Image processing, Error analysis, Distortion, Computer simulations, Data processing, Finite element methods, Photomasks, Chemical elements

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