Dr. Kent H. Nakagawa
Manager at Toppan Photomasks Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (19)

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Refractive index, Metrology, Data modeling, Calibration, Manufacturing, 3D modeling, Photoresist materials, Photomasks, Optical proximity correction, Semiconducting wafers

SPIE Journal Paper | December 2, 2013
JM3 Vol. 13 Issue 01
KEYWORDS: Photomasks, Semiconducting wafers, 3D modeling, Optical proximity correction, Critical dimension metrology, Calibration, Photoresist materials, Computational lithography, Data modeling, Mathematical modeling

PROCEEDINGS ARTICLE | September 10, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Mathematical modeling, Data modeling, Calibration, Manufacturing, 3D modeling, Photoresist materials, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Data modeling, Calibration, Manufacturing, 3D modeling, Photomasks, Computational lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Process modeling

PROCEEDINGS ARTICLE | May 27, 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Scanners, Image registration, Pellicles, Photomasks, Double patterning technology, Optical alignment, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | June 2, 2004
Proc. SPIE. 5504, 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Seaborgium, Databases, Manufacturing, Data processing, Photomasks, Integrated circuits, Beam shaping, Optical proximity correction, Data conversion, Information operations

Showing 5 of 19 publications
Conference Committee Involvement (1)
Photomask Technology
17 September 2018 | Monterey, California, United States
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