Dr. Kent H. Nakagawa
Director at Toppan Photomasks Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (21)

Proceedings Article | 20 September 2020 Presentation + Paper
Proc. SPIE. 11518, Photomask Technology 2020
KEYWORDS: Metrology, Waveguides, Signal attenuation, Copper, Manufacturing, Clouds, Photonics, Photomasks, Vertical cavity surface emitting lasers, Silicon photonics

Proceedings Article | 3 October 2018 Presentation + Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Electron beams, Data modeling, Databases, Image segmentation, Manufacturing, Printing, Photomasks, Raster graphics, Computer aided design

Proceedings Article | 17 October 2014 Paper
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Refractive index, Metrology, Data modeling, Calibration, Manufacturing, 3D modeling, Photoresist materials, Photomasks, Optical proximity correction, Semiconducting wafers

SPIE Journal Paper | 2 December 2013
JM3 Vol. 13 Issue 01
KEYWORDS: Photomasks, Semiconducting wafers, 3D modeling, Optical proximity correction, Critical dimension metrology, Calibration, Photoresist materials, Computational lithography, Data modeling, Mathematical modeling

Proceedings Article | 10 September 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Mathematical modeling, Data modeling, Calibration, Manufacturing, 3D modeling, Photoresist materials, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Showing 5 of 21 publications
Conference Committee Involvement (3)
Photomask Technology
21 September 2020 | Online Only, California, United States
Photomask Technology
16 September 2019 | Monterey, California, United States
Photomask Technology
17 September 2018 | Monterey, California, United States
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