Kentaro Goto
Manager at JSR Corp
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 20 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Etching, Resistance, Hydrogen, Chemical vapor deposition, Fluorine, Fourier transforms, Optical lithography, Critical dimension metrology, Double patterning technology, Extreme ultraviolet

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Etching, Diffusion, Semiconducting wafers, Line width roughness, Photoresist processing, Silica, Optical lithography

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Diffusion, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Line width roughness, Yield improvement, Glasses, Optical lithography, Polymers, Quantum efficiency

Proceedings Article | 26 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Double patterning technology, Photoresist processing, Lithography, Manufacturing, Optical lithography, Silica, Water, Immersion lithography, Critical dimension metrology, Extreme ultraviolet lithography

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Diffusion, Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Glasses, Lithography, Amplifiers, Photoresist processing, Optical amplifiers, Magnesium

Showing 5 of 7 publications
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