Kentaro Matsunaga
Researcher
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Semiconductors, Lithography, Etching, Scanning electron microscopy, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Fullerenes

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Silica, Etching, Scanning electron microscopy, Photomasks, Double patterning technology, Critical dimension metrology, Photoresist processing

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Semiconductors, Lithography, Lithographic illumination, Manufacturing, Extreme ultraviolet, Extreme ultraviolet lithography, Reactive ion etching, Photoresist processing, Semiconducting wafers, Yield improvement

Proceedings Article | 5 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Wafer-level optics, Lithography, Modulation, Control systems, Projection systems, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 25 March 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Semiconductors, Lithography, Etching, Polymers, Manufacturing, Scanning electron microscopy, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing

Showing 5 of 21 publications
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