Kerry J. Nagel
at Everspin Technologies Inc
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 3 September 1999
Proc. SPIE. 3882, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing V
KEYWORDS: Oxides, Optical lithography, Etching, Silicon, Chemistry, Photoresist materials, Photomasks, Critical dimension metrology, Yield improvement, Photoresist developing

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