Keundo Ban
at SK Hynix Inc
SPIE Involvement:
Author
Publications (17)

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Metrology, Optical lithography, Etching, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Double patterning technology, Critical dimension metrology, Edge roughness

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Scanners, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, High volume manufacturing, Nanoimprint lithography

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Reticles, Silicon, Reflectivity, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Critical dimension metrology, Ruthenium

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Optical lithography, Deep ultraviolet, Scanners, Silicon, Laser scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 3, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Polymers, Polymerization, Line width roughness, Palladium, Promethium, Immersion lithography, Line edge roughness, Photoresist processing, Semiconducting wafers, Polymer thin films

PROCEEDINGS ARTICLE | April 2, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Metrology, Molecular bridges, Particles, Coating, Bridges, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

Showing 5 of 17 publications
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