Keundo Ban
at SK Hynix Inc
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Metrology, Optical lithography, Etching, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Double patterning technology, Critical dimension metrology, Edge roughness

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Scanners, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, High volume manufacturing, Nanoimprint lithography

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Reticles, Silicon, Reflectivity, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Critical dimension metrology, Ruthenium

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Optical lithography, Deep ultraviolet, Scanners, Silicon, Laser scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 3 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Polymers, Polymerization, Line width roughness, Palladium, Promethium, Immersion lithography, Line edge roughness, Photoresist processing, Semiconducting wafers, Polymer thin films

Proceedings Article | 2 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Metrology, Molecular bridges, Particles, Coating, Bridges, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

Showing 5 of 17 publications
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