CONFERENCE PROCEEDINGS
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Keunjun Kim
at SK Hynix Inc
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Publications (3)
Proceedings Article | 18 March 2016 Paper
Investigation on the relationship between CD and CDU in memory devices
Jeongsu Park, Daewoo Kim, Keunjun Kim, Choidong Kim, Sungkoo Lee, Hyeongsoo Kim
Proceedings Volume 9778, 97782T (2016) https://doi.org/10.1117/12.2219569
KEYWORDS: Critical dimension metrology, Control systems, Resistance, Metrology, Inspection, Nanoimprint lithography, Photomasks, Semiconducting wafers, Line edge roughness, Electroluminescence, Image compression
Proceedings Article | 15 March 2016 Paper
Investigation of systematic CD distribution error on intrafield
Keunjun Kim, Daewoo Kim, Junghyun Kang, Inseok Jeong, Sungkoo Lee, Hyeongsoo Kim
Proceedings Volume 9780, 978013 (2016) https://doi.org/10.1117/12.2219562
KEYWORDS: Critical dimension metrology, Etching, SRAF, Photomasks, Scattering, Semiconducting wafers, Mask making, Stray light, Optical lithography, Chemical mechanical planarization, Lithography, Chemical analysis
Proceedings Article | 7 March 2008 Paper
Double patterning of contact array with carbon polymer
Woo-Yung Jung, Guee-Hwang Sim, Sang-Min Kim, Choi-Dong Kim, Sung-Min Jeon, Keunjun Kim, Sang-Wook Park, Byung-Seok Lee, Sung-Ki Park, Hoon-Hee Cho, Ji-Soo Kim
Proceedings Volume 6924, 69240C (2008) https://doi.org/10.1117/12.771092
KEYWORDS: Silicon, Etching, Carbon, Polymers, Optical lithography, Silicon carbide, Coating, Line width roughness, Double patterning technology, System on a chip
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