Keunjun Kim
at SK Hynix Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 18 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Metrology, Image compression, Resistance, Inspection, Control systems, Electroluminescence, Photomasks, Nanoimprint lithography, Critical dimension metrology, Line edge roughness, Semiconducting wafers

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Optical lithography, Scattering, Etching, Photomasks, Chemical analysis, SRAF, Mask making, Critical dimension metrology, Stray light, Semiconducting wafers, Chemical mechanical planarization

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Carbon, Optical lithography, Etching, Polymers, Silicon, Coating, Line width roughness, Double patterning technology, Silicon carbide, System on a chip

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