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Keunwon Park
Vice President, AP Operations at Toppan Photomasks Inc
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Publications (1)
Proceedings Article | 22 January 2001 Paper
Double-step process for manufacturing reticle to reduce gate CD variation
Makoto Kozuma, Masaya Komatsu, Rieko Arakawa, Seiji Kubo, Tatsuya Takahashi, John Jensen, Hyun-Suk Bang, Il-Ho Lee, Cheol Shin, Hong-Seok Kim, Keun-Won Park
Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410759
KEYWORDS: Reticles, Critical dimension metrology, Logic, Image processing, Overlay metrology, Computer aided design, Manufacturing, Dry etching, Transistors, Etching
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