Dr. Keven Yu
Key Account Technologist at Applied Materials Inc
SPIE Involvement:
Publications (10)

Proceedings Article | 23 October 2015 Paper
Madhavi Chandrachood, Michael Grimbergen, Keven Yu, Toi Leung, Jeffrey Tran, Jeff Chen, Darin Bivens, Rao Yalamanchili, Richard Wistrom, Tom Faure, Peter Bartlau, Shaun Crawford, Yoshifumi Sakamoto
Proceedings Volume 9635, 963516 (2015) https://doi.org/10.1117/12.2199030
KEYWORDS: Etching, Photomasks, Opacity, Chromium, Critical dimension metrology, Process control, Phase shifts, Photoresist processing, Line edge roughness, Phase modulation

Proceedings Article | 1 October 2013 Paper
Michael Grimbergen, Madhavi Chandrachood, Jeffrey Tran, Becky Leung, Keven Yu, Amitabh Sabharwal, Ajay Kumar
Proceedings Volume 8880, 88800X (2013) https://doi.org/10.1117/12.2029006
KEYWORDS: Etching, Photoresist materials, Ions, Chromium, Reactive ion etching, Model-based design, Photomasks, Solids, Plasma, Silicon

Proceedings Article | 8 November 2012 Paper
Michael Grimbergen, Madhavi Chandrachood, Keven Yu, Toi Yue Leung, Amitabh Sabharwal, Ajay Kumar
Proceedings Volume 8522, 85222M (2012) https://doi.org/10.1117/12.981215
KEYWORDS: Etching, Photomasks, Photoresist materials, Binary data, Data modeling, Signal processing, Plasma etching, Lithography, Wave propagation, Plasma

Proceedings Article | 14 October 2011 Paper
John Whang, Madhavi Chandrachood, Emily Gallagher, Tom Faure, Michael Grimbergen, Shaun Crawford, Keven Yu, T. Y .B Leung, Richard Wistrom, Amitabh Sabharwal, Jeff Chen, Banqiu Wu
Proceedings Volume 8166, 81661W (2011) https://doi.org/10.1117/12.898815
KEYWORDS: Etching, Photomasks, Extreme ultraviolet, Ruthenium, Line edge roughness, Multilayers, Binary data, Manufacturing, Extreme ultraviolet lithography, Tantalum

Proceedings Article | 6 November 2009 Paper
Michael Grimbergen, D. G. Nest, Keven Yu, T. Y. Leung, Madhavi Chandrachood, Alan Ouye, Saravjeet Singh, Ibrahim Ibrahim, Ajay Kumar, David Graves
Proceedings Volume 7488, 74880L (2009) https://doi.org/10.1117/12.833490
KEYWORDS: Plasma, Ions, Etching, Electrodes, Argon, Chlorine, Plasma etching, Emission spectroscopy, Ceramics, Ultraviolet radiation

Showing 5 of 10 publications
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