Dr. Keven Yu
Key Account Technologist at Applied Materials Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Phase modulation, Opacity, Etching, Chromium, Process control, Photomasks, Critical dimension metrology, Line edge roughness, Photoresist processing, Phase shifts

Proceedings Article | 1 October 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Etching, Ions, Silicon, Chromium, Photoresist materials, Solids, Photomasks, Reactive ion etching, Model-based design, Plasma

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Data modeling, Etching, Photoresist materials, Wave propagation, Signal processing, Photomasks, Plasma etching, Binary data, Plasma

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Multilayers, Etching, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Tantalum, Binary data, Ruthenium

Proceedings Article | 6 November 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Etching, Argon, Electrodes, Ultraviolet radiation, Ceramics, Ions, Emission spectroscopy, Plasma etching, Chlorine, Plasma

Showing 5 of 10 publications
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