Mr. Kevin B. Edwards
Application Engineer at Brewer Science Inc
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | April 1, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Diffraction, Reflection, Ultraviolet radiation, Diffusion, Reflectivity, Critical dimension metrology, Fused deposition modeling, UV optics, Phase shifts

PROCEEDINGS ARTICLE | April 2, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Multilayers, Etching, Silicon, Reflectivity, Photomasks, Plasma etching, Semiconducting wafers, System on a chip, Plasma

PROCEEDINGS ARTICLE | April 11, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Optical lithography, Etching, Copper, Dielectrics, Silicon, Coating, Wet etching, Semiconductor manufacturing, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Optical lithography, Etching, Polymers, Metals, Materials processing, Photoresist materials, Reactive ion etching, Semiconducting wafers, Standards development

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