Kevin Heidrich
Director New Product Development at Nanometrics Inc
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 22 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Diffraction, Reticles, Data modeling, Scanners, Reflectivity, Time metrology, Process control, Semiconducting wafers, Tolerancing, Overlay metrology

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