Kevin R. Lensing
Member of Technical Staff at Advanced Micro Devices Inc
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 22 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Reticles, Metrology, Data modeling, Numerical analysis, Process control, Finite element methods, Critical dimension metrology, Semiconducting wafers, Testing and analysis

Proceedings Article | 22 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Metrology, Diffractive optical elements, Etching, Germanium, Silicon, Transmission electron microscopy, Scatterometry, Process control, Semiconducting wafers, Scatter measurement

Proceedings Article | 4 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Reticles, Metrology, Data modeling, Scatterometry, Process control, Finite element methods, Critical dimension metrology, Semiconducting wafers, Systems modeling

Proceedings Article | 4 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Mathematical modeling, Monochromatic aberrations, Reticles, Cadmium, Scanners, Scatterometry, Finite element methods, Critical dimension metrology, Semiconducting wafers, Fused deposition modeling

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Metrology, Cadmium, Spatial frequencies, Scanners, Scatterometry, Immersion lithography, Modulation transfer functions, Critical dimension metrology, Semiconducting wafers

Showing 5 of 8 publications
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