Dr. Kevin Lucas
at Synopsys Inc
SPIE Involvement:
Conference Program Committee | Author | Instructor
Publications (132)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Image processing, Photomasks, Extreme ultraviolet lithography, Double patterning technology, Optical proximity correction

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Optical lithography, Data modeling, Manufacturing, Control systems, Neural networks, Machine learning, Optical proximity correction, SRAF, Neurons

PROCEEDINGS ARTICLE | September 28, 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Lithography, Optical lithography, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Resolution enhancement technologies

PROCEEDINGS ARTICLE | April 4, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Optical lithography, Atrial fibrillation, Image processing, Manufacturing, Photomasks, Source mask optimization, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Reticles, Optical lithography, Atrial fibrillation, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 16, 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Lithography, Optical lithography, Atrial fibrillation, Computer programming, Software development, Photomasks, Optical proximity correction, Model-based design, 193nm lithography, Resolution enhancement technologies

Showing 5 of 132 publications
Conference Committee Involvement (2)
Design-Process-Technology Co-optimization for Manufacturability XIII
24 February 2019 | San Jose, California, United States
Optical Microlithography XXXI
27 February 2018 | San Jose, California, United States
Course Instructor
SC540: Applying Optical Proximity Correction and Design for Manufacturability to Product Designs
Optical proximity correction (OPC) is now a requirement for advanced semiconductor manufacturing. OPC alters the designed layout to compensate for systematic patterning distortions and/or to implement process latitude improving methods. Accurate and practical model-based OPC implementation is needed with essentially all lithography resolution enhancement techniques (RET) on complex real world designs. This practical example-oriented class will prepare attendees to implement manufacturable rule and model-based OPC on their product designs and introduce them to optimized OPC, design & process solution methods known as lithographic Design for Manufacturability (DFM).
SC990: Optical Proximity Correction for Current and Future Nodes
Optical proximity correction (OPC) and reticle enhancement techniques (RET) are fundamental requirements for advanced semiconductor manufacturing. OPC is a class of techniques which alter the design layout in order to: compensate for systematic patterning distortions; implement process latitude improving methods (i.e., RET); and verify mask pattern correctness. Accurate and practical rule-based or model-based OPC methods are needed to correctly implement essentially all advanced lithography extensions (e.g., sub-resolution assist features, double patterning, EUV) on complex real world designs. This practical example-oriented class will help prepare attendees to understand, implement and validate manufacturable rule and model-based OPC on their product designs.
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