Dr. Kevin Lucas
Product Engineering manager at Synopsys Inc
SPIE Involvement:
Conference Program Committee | Author | Instructor
Publications (148)

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume 12954, 1295413 (2024) https://doi.org/10.1117/12.3014637
KEYWORDS: Photomasks, Deep ultraviolet, Optical proximity correction, Extreme ultraviolet lithography, Ecosystems, Lithography, Extreme ultraviolet, Yield improvement, Source mask optimization, Printing

Proceedings Article | 10 April 2024 Presentation + Paper
Enas Sakr, Zac Levinson, Rob DeLancey, C. Jay Lee, Jinguang Li, Ryan Chen, Robert Iwanow, Delian Yang, Wolfgang Hoppe, Folarin Latinwo, Kevin Lucas, Peng Liu
Proceedings Volume 12954, 129540N (2024) https://doi.org/10.1117/12.3013089
KEYWORDS: Optical proximity correction, Electromagnetism, Semiconducting wafers, Extreme ultraviolet, Cadmium, 3D mask effects, Modeling, Lithography, Computational lithography, Ranging

Proceedings Article | 10 April 2024 Presentation + Paper
Elizabeth Grubbs, Bernd Kuechler, Hyesook Hong, Enas Sakr, Lena Zavyalova, Folarin Latinwo, Delian Yang, Linghui Wu, Yan Feng, Kevin Lucas
Proceedings Volume 12954, 129540S (2024) https://doi.org/10.1117/12.3013125
KEYWORDS: 3D modeling, Modeling, Lithography, Data modeling, Calibration, Deep ultraviolet, Optical proximity correction, Extreme ultraviolet, Photoresist processing, Shrinkage

SPIE Journal Paper | 20 December 2023
JM3, Vol. 22, Issue 04, 041606, (December 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041606
KEYWORDS: Optical proximity correction, Extreme ultraviolet lithography, Lithography, Optical lithography, Machine learning, Extreme ultraviolet, Semiconducting wafers, Education and training, Industry, Source mask optimization

Proceedings Article | 28 April 2023 Presentation + Paper
Enas Sakr, Rob DeLancey, Wolfgang Hoppe, Zac Levinson, Robert Iwanow, Ryan Chen, Delian Yang, Kevin Lucas
Proceedings Volume 12495, 124950P (2023) https://doi.org/10.1117/12.2658720
KEYWORDS: Extreme ultraviolet, Optical proximity correction, Multilayers, Optical lithography, Modeling, 3D mask effects