Dr. Kevin Lucas
Engineer at Synopsys Inc
SPIE Involvement:
Conference Program Committee | Author | Instructor
Publications (135)

Proceedings Article | 21 March 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Lithography, Optical lithography, Data modeling, Calibration, 3D modeling, Photoresist materials, Photoresist developing

Proceedings Article | 20 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Data modeling, Calibration, 3D modeling, Printing, Photomasks, Machine learning, Optical proximity correction, Semiconducting wafers

Proceedings Article | 8 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Optical lithography, Data modeling, 3D modeling, Photoresist materials, Photomasks, Optical proximity correction, Photoresist processing, Semiconducting wafers, Photoresist developing

Proceedings Article | 19 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Image processing, Photomasks, Extreme ultraviolet lithography, Double patterning technology, Optical proximity correction

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Optical lithography, Data modeling, Manufacturing, Control systems, Neural networks, Machine learning, Optical proximity correction, SRAF, Neurons

Proceedings Article | 28 September 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Lithography, Optical lithography, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Resolution enhancement technologies

Showing 5 of 135 publications
Conference Committee Involvement (3)
Design-Process-Technology Co-optimization for Manufacturability XIV
23 February 2020 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XIII
27 February 2019 | San Jose, California, United States
Optical Microlithography XXXI
27 February 2018 | San Jose, California, United States
Course Instructor
SC540: Applying Optical Proximity Correction and Design for Manufacturability to Product Designs
Optical proximity correction (OPC) is now a requirement for advanced semiconductor manufacturing. OPC alters the designed layout to compensate for systematic patterning distortions and/or to implement process latitude improving methods. Accurate and practical model-based OPC implementation is needed with essentially all lithography resolution enhancement techniques (RET) on complex real world designs. This practical example-oriented class will prepare attendees to implement manufacturable rule and model-based OPC on their product designs and introduce them to optimized OPC, design & process solution methods known as lithographic Design for Manufacturability (DFM).
SC990: Optical Proximity Correction for Current and Future Nodes
Optical proximity correction (OPC) and reticle enhancement techniques (RET) are fundamental requirements for advanced semiconductor manufacturing. OPC is a class of techniques which alter the design layout in order to: compensate for systematic patterning distortions; implement process latitude improving methods (i.e., RET); and verify mask pattern correctness. Accurate and practical rule-based or model-based OPC methods are needed to correctly implement essentially all advanced lithography extensions (e.g., sub-resolution assist features, double patterning, EUV) on complex real world designs. This practical example-oriented class will help prepare attendees to understand, implement and validate manufacturable rule and model-based OPC on their product designs.
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top