Dr. Kevin Orvek
Senior Staff Engineer at SUNY Poly SEMATECH
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 30 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Wafer-level optics, Reticles, Scanners, Error analysis, Distortion, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Overlay metrology

Proceedings Article | 27 May 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Polishing, Etching, Particles, Manufacturing, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Anisotropic etching, Surface finishing

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Particles, Manufacturing, Inspection, Surface roughness, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Deposition processes, Defect inspection

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Polishing, Scanners, Distortion, Finite element methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Reticles, Contamination, Silica, Particles, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Standards development

Showing 5 of 21 publications
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