Dr. Kevin Orvek
Senior Staff Engineer at SUNY Poly SEMATECH
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 30 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Reticles, Extreme ultraviolet, Extreme ultraviolet lithography, Overlay metrology, Error analysis, Scanners, Semiconducting wafers, Distortion, Photomasks, Wafer-level optics

Proceedings Article | 27 May 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Particles, Polishing, Surface finishing, Ion beams, Etching, Anisotropic etching, Manufacturing

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Photomasks, Particles, Extreme ultraviolet, Extreme ultraviolet lithography, Inspection, Lithography, Deposition processes, Defect inspection, Surface roughness, Manufacturing

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Photomasks, Scanners, Semiconducting wafers, Extreme ultraviolet lithography, Finite element methods, Extreme ultraviolet, Polishing, Distortion, Overlay metrology, Optical alignment

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Reticles, Extreme ultraviolet, Inspection, Photomasks, Particles, Extreme ultraviolet lithography, Silica, Semiconducting wafers, Standards development, Contamination

Proceedings Article | 2 May 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Extreme ultraviolet lithography, Interferometry, Photomasks, Reticles, Data modeling, 3D modeling, Mathematical modeling, Photography, Image quality, Control systems

Showing 5 of 21 publications
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