CONFERENCE PROCEEDINGS
Advanced Search
Kevin Ryan
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 15 March 2016 Paper
Reduction of wafer-edge overlay errors using advanced correction models, optimized for minimal metrology requirements
Min-Suk Kim, Hwa-Yeon Won, Jong-Mun Jeong, Paul Böcker, Lydia Vergaij-Huizer, Michiel Kupers, Milenko Jovanović, Inez Sochal, Kevin Ryan, Kyu-Tae Sun, Young-Wan Lim, Jin-Moo Byun, Gwang-Gon Kim, Jung-Joon Suh
Proceedings Volume 9780, 97800A (2016) https://doi.org/10.1117/12.2220459
KEYWORDS: Semiconductor manufacturing, Performance modeling, Metrology, Overlay metrology, Lithography, Semiconducting wafers, Process modeling, Optical lithography, Process control, Lithium, Yield improvement, Data modeling
Proceedings Article | 23 October 2015 Paper
Reduction of in-lot overlay variation with integrated metrology, and a holistic control strategy
Hong-Goo Lee, Sang-Jun Han, Won-Kwang Ma, Young-Sik Kim, Noh-Jung Kwak, Paul Böcker, David Deckers, Weitian Kou, Michiel Kupers, Kevin Ryan, Elliott McNamara, Gwang-Gon Kim, Kyu-Tae Sun, Young-Wan Lim, Jin-Moo Byun, Jung-Joon Suh
Proceedings Volume 9635, 96351S (2015) https://doi.org/10.1117/12.2196879
KEYWORDS: Semiconducting wafers, Metrology, Principal component analysis, Overlay metrology, Optical alignment, Immersion lithography, Time metrology, Scanners, Semiconductor manufacturing, Diffraction
Proceedings Article | 19 March 2015 Paper
Improving full-wafer on-product overlay using computationally designed process-robust and device-like metrology targets
Young-Sik Kim, Young-Sun Hwang, Mi-Rim Jung, Ji-Hwan Yoo, Won-Taik Kwon, Kevin Ryan, Paul Tuffy, Youping Zhang, Sean Park, Nang-Lyeom Oh, Chris Park, Mir Shahrjerdy, Roy Werkman, Kyu-Tae Sun, Jin-Moo Byun
Proceedings Volume 9424, 942414 (2015) https://doi.org/10.1117/12.2085645
KEYWORDS: Overlay metrology, Metrology, Target detection, Semiconducting wafers, Optical proximity correction, Resolution enhancement technologies, Reticles, Lithography, Optical lithography, Etching
Proceedings Article | 19 March 2015 Paper
Virtual overlay metrology for fault detection supported with integrated metrology and machine learning
Hong-Goo Lee, Emil Schmitt-Weaver, Min-Suk Kim, Sang-Jun Han, Myoung-Soo Kim, Won-Taik Kwon, Sung-Ki Park, Kevin Ryan, Thomas Theeuwes, Kyu-Tae Sun, Young-Wan Lim, Daan Slotboom, Michael Kubis, Jens Staecker
Proceedings Volume 9424, 94241T (2015) https://doi.org/10.1117/12.2085475
KEYWORDS: Semiconducting wafers, Overlay metrology, Metrology, Wafer testing, Machine learning, Neural networks, Data modeling, Optical alignment, Scanners, Process engineering
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top