Kevin Ryan
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Metrology, Lithium, Optical lithography, Data modeling, Process control, Semiconductor manufacturing, Semiconducting wafers, Yield improvement, Performance modeling, Overlay metrology, Process modeling

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Diffraction, Metrology, Principal component analysis, Scanners, Time metrology, Semiconductor manufacturing, Immersion lithography, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Target detection, Lithography, Reticles, Metrology, Optical lithography, Etching, Optical proximity correction, Semiconducting wafers, Overlay metrology, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Metrology, Data modeling, Scanners, Neural networks, Machine learning, Optical alignment, Semiconducting wafers, Wafer testing, Overlay metrology, Process engineering

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