Mr. Ki-Ho Ko
at Hanyang Univ
SPIE Involvement:
Author
Publications (5)

SPIE Journal Paper | June 9, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Pellicles, Photomasks, Optical proximity correction, Extreme ultraviolet, Optical lithography, Image transmission, Absorption, Nanoimprint lithography, Extreme ultraviolet lithography, Logic

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Optical lithography, Pellicles, Image transmission, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Nanoimprint lithography, Critical dimension metrology, Absorption

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Refractive index, Phase shifting, Optical lithography, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Phase velocity, Ruthenium

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Thin films, Lithography, Silicon, Pellicles, Photomasks, Extreme ultraviolet, Optical simulations, Extreme ultraviolet lithography, Semiconducting wafers, Absorption

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Thin films, Lithography, Data modeling, Silicon, Distortion, Computer simulations, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

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