Dr. Kim Dean
Process Development Engineer at CH2M Hill
SPIE Involvement:
Publications (35)

Proceedings Article | 15 April 2008 Paper
Robert Brainard, Elsayed Hassanein, Juntao Li, Piyush Pathak, Brad Thiel, Franco Cerrina, Richard Moore, Miguel Rodriguez, Boris Yakshinskiy, Elena Loginova, Theodore Madey, Richard Matyi, Matt Malloy, Andrew Rudack, Patrick Naulleau, Andrea Wüest, Kim Dean
Proceedings Volume 6923, 692325 (2008) https://doi.org/10.1117/12.773869
KEYWORDS: Electrons, Photons, Quantum efficiency, Extreme ultraviolet, Polymers, Monte Carlo methods, Extreme ultraviolet lithography, Oscillators, Line width roughness, Electronics

Proceedings Article | 3 April 2008 Paper
Patrick Naulleau, Christopher Anderson, Jerrin Chiu, Kim Dean, Paul Denham, Kenneth Goldberg, Brian Hoef, Sungmin Huh, Gideon Jones, Bruno LaFontaine, Andy Ma, Dimitra Niakoula, Joo-on Park, Tom Wallow
Proceedings Volume 6921, 69213N (2008) https://doi.org/10.1117/12.773833
KEYWORDS: Line edge roughness, Monochromatic aberrations, Extreme ultraviolet, Photomasks, Printing, Lithography, Extreme ultraviolet lithography, Semiconducting wafers, Projection systems, Wafer-level optics

Proceedings Article | 3 April 2008 Paper
Andy Ma, Joo-on Park, Kim Dean, Stefan Wurm, Patrick Naulleau
Proceedings Volume 6921, 69213O (2008) https://doi.org/10.1117/12.775037
KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Printing, Scanning electron microscopy, Lithography, Real-time computing, Electroluminescence, Head-mounted displays, Photoresist processing

Proceedings Article | 28 March 2008 Paper
Elsayed Hassanein, Craig Higgins, Patrick Naulleau, Richard Matyi, Gregg Gallatin, Gregory Denbeaux, Alin Antohe, Jim Thackeray, Kathleen Spear, Charles Szmanda, Christopher Anderson, Dimitra Niakoula, Matthew Malloy, Anwar Khurshid, Cecilia Montgomery, Emil Piscani, Andrew Rudack, Jeff Byers, Andy Ma, Kim Dean, Robert Brainard
Proceedings Volume 6921, 69211I (2008) https://doi.org/10.1117/12.774099
KEYWORDS: Quantum efficiency, Extreme ultraviolet lithography, Photoresist materials, Extreme ultraviolet, X-rays, Absorbance, Photons, Coating, Reflectometry, Line edge roughness

Proceedings Article | 28 March 2008 Paper
Proceedings Volume 6921, 69211G (2008) https://doi.org/10.1117/12.772670
KEYWORDS: Mirrors, Reflectivity, EUV optics, Molecules, Extreme ultraviolet lithography, Contamination, Spectroscopy, Extreme ultraviolet, Photoresist materials, Calibration

Showing 5 of 35 publications
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