Dr. Kim Dean
Process Development Engineer at CH2M Hill
SPIE Involvement:
Author
Publications (35)

PROCEEDINGS ARTICLE | April 15, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Electronics, Oscillators, Polymers, Photons, Electrons, Quantum efficiency, Monte Carlo methods, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | April 3, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Lithography, Electroluminescence, Scanning electron microscopy, Printing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Head-mounted displays, Photoresist processing, Real-time computing

PROCEEDINGS ARTICLE | April 3, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Wafer-level optics, Lithography, Monochromatic aberrations, Printing, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | March 28, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Photons, X-rays, Quantum efficiency, Coating, Photoresist materials, Reflectometry, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Line edge roughness

PROCEEDINGS ARTICLE | March 28, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Mirrors, Contamination, Calibration, Spectroscopy, Molecules, Reflectivity, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

PROCEEDINGS ARTICLE | March 21, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Lithography, Data modeling, Image resolution, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Line edge roughness, Photoresist processing, Yield improvement, Photoresist developing

Showing 5 of 35 publications
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