Mr. Kiminori Yoshino
at Toshiba Corp
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Wafer-level optics, Diffraction, Reticles, Calibration, Scanners, Image analysis, Critical dimension metrology, Semiconducting wafers, Overlay metrology, New and emerging technologies

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Wafer-level optics, Semiconductors, Polarization, Birefringence, Reflectivity, Photoresist materials, Objectives, Critical dimension metrology, Astronomical imaging, Semiconducting wafers

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Lithography, Visible radiation, Deep ultraviolet, Polarization, Scattering, Ultraviolet radiation, Light scattering, Inspection, Bridges, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Finite-difference time-domain method, Defect detection, Polarization, Dielectrics, Inspection, Optical inspection, Near field, Optical simulations, Near field optics, Defect inspection

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Diffraction, Polarization, Inspection, Polarizers, Image analysis, Photoresist materials, Process control, Objectives, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Wafer-level optics, Diffraction, Polarization, Birefringence, Inspection, Optical simulations, Critical dimension metrology, Semiconducting wafers, Wafer testing, New and emerging technologies

Showing 5 of 10 publications
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