Kiminori Yoshino
at Toshiba Corp
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Semiconducting wafers, Diffraction, Scanners, Reticles, Calibration, Overlay metrology, Wafer-level optics, Critical dimension metrology, Image analysis

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Wafer-level optics, Birefringence, Reflectivity, Photoresist materials, Polarization, Objectives, Astronomical imaging, Semiconductors

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Scattering, Light scattering, Deep ultraviolet, Polarization, Semiconducting wafers, Inspection, Ultraviolet radiation, Lithography, Bridges, Visible radiation

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Inspection, Polarization, Near field optics, Defect inspection, Finite-difference time-domain method, Dielectrics, Defect detection, Optical inspection, Near field, Optical simulations

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Semiconducting wafers, Diffraction, Polarizers, Inspection, Critical dimension metrology, Objectives, Image analysis, Polarization, Photoresist materials, Process control

Showing 5 of 10 publications
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