Dr. Kirk J. Strozewski
Principal Lithography Engineer at Synopsys Inc
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 24 May 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Reticles, Optical lithography, Deep ultraviolet, Inspection, Photomasks, Mask making, Semiconducting wafers

Proceedings Article | 3 May 2004
Proc. SPIE. 5379, Design and Process Integration for Microelectronic Manufacturing II
KEYWORDS: Lithography, Reticles, Logic, Optical lithography, Metals, Manufacturing, Design for manufacturing, Optical proximity correction, Yield improvement, Model-based design

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Reticles, Logic, Lithographic illumination, Printing, Photomasks, Optical proximity correction, Nanoimprint lithography, Binary data, Phase shifts

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Optical design, Reticles, Logic, Optical lithography, Lithographic illumination, Scanners, Optical proximity correction, SRAF, 193nm lithography

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Optical lithography, Cadmium, Etching, Polymers, Photomasks, Photoresist processing, Semiconducting wafers, Binary data, 193nm lithography

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top