Dr. Kishore K. Chakravorty
at Intel Corp
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Defect detection, Deep ultraviolet, Inspection, Optical inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

Proceedings Article | 11 November 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Deep ultraviolet, Scanners, Particles, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Reticles, Logic, Optical lithography, Etching, Quartz, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Phase shifts

Proceedings Article | 5 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Etching, Quartz, Chromium, Optical testing, Scanning electron microscopy, Photomasks, Neodymium, Tolerancing, Overlay metrology, Phase shifts

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Optical lithography, Opacity, Etching, Glasses, Chromium, Phase shift keying, Photomasks, Optical proximity correction, Phase shifts

Showing 5 of 7 publications
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