Dr. Kishore K. Chakravorty
APSM Group Leader at Intel Corp
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | November 11, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Deep ultraviolet, Scanners, Particles, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Reticles, Logic, Optical lithography, Etching, Quartz, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Phase shifts

PROCEEDINGS ARTICLE | November 5, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Etching, Quartz, Chromium, Optical testing, Scanning electron microscopy, Photomasks, Neodymium, Tolerancing, Overlay metrology, Phase shifts

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Optical lithography, Opacity, Etching, Glasses, Chromium, Phase shift keying, Photomasks, Optical proximity correction, Phase shifts

PROCEEDINGS ARTICLE | April 1, 1991
Proc. SPIE. 1389, Microelectronic Interconnects and Packages: Optical and Electrical Technologies
KEYWORDS: Packaging, Refractive index, Waveguides, Birefringence, Scattering, Polymers, Chemistry, Planar waveguides, Semiconducting wafers, Near field optics

PROCEEDINGS ARTICLE | December 1, 1990
Proc. SPIE. 1323, Optical Thin Films III: New Developments
KEYWORDS: Thin films, Refractive index, Waveguides, Optical properties, Scattering, Ultraviolet radiation, Dielectrics, Chemistry, Planar waveguides, Semiconducting wafers

Showing 5 of 6 publications
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