Dr. Kiwamu Takehisa
Senior Scientist at O2 Laser Laboratory
SPIE Involvement:
Author | Editor
Publications (24)

Proceedings Article | 10 April 2024 Poster + Paper
Proceedings Volume 12953, 129531C (2024) https://doi.org/10.1117/12.3011965
KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Scanners, Extreme ultraviolet

Proceedings Article | 9 April 2020 Paper
Proceedings Volume 11323, 113231K (2020) https://doi.org/10.1117/12.2557858
KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Reticles, Defect detection, High volume manufacturing, Particles, Pellicles, Deep ultraviolet

Proceedings Article | 25 November 2019 Open Access Paper
Proceedings Volume 11148, 111480W (2019) https://doi.org/10.1117/12.2538001
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Defect inspection, Deep ultraviolet, Defect detection, Semiconducting wafers, Extreme ultraviolet lithography, Lithography, Image resolution

Proceedings Article | 7 October 2019 Paper
Proceedings Volume 11162, 1116201 (2019) https://doi.org/10.1117/12.2524683
KEYWORDS: Satellites, Chemical lasers, Atmospheric propagation, Space based lasers, Optical simulations, Defense systems

Proceedings Article | 9 October 2018 Presentation + Paper
Proceedings Volume 10798, 1079803 (2018) https://doi.org/10.1117/12.2318141
KEYWORDS: Chemical oxygen iodine lasers, Missiles, Defense systems, Chemical lasers, Mirrors, Laser resonators, Laser missile defense, Atmospheric propagation, Oxygen, Helium

Showing 5 of 24 publications
Proceedings Volume Editor (2)

Conference Committee Involvement (2)
Photomask Japan 2018
18 April 2018 | Yokohama, Japan
Photomask Japan 2017
5 April 2017 | Yokohama, Japan
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