Kiyoshi Fujii
Group Leader at Semiconductor Leading Edge Technologies Inc
SPIE Involvement:
Author
Publications (29)

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Semiconductors, Point spread functions, Electronics, Cadmium, Scattering, Scanners, Error analysis, Photomasks, Logic devices, Critical dimension metrology

PROCEEDINGS ARTICLE | April 11, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Quartz, Crystals, Photography, Scanning electron microscopy, Bridges, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 21, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Microfluidics, Optical lithography, Water, Photomasks, Resonance energy transfer, Immersion lithography, Photoresist processing, Semiconducting wafers, Standards development

PROCEEDINGS ARTICLE | March 21, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Refractive index, Microfluidics, Water, Interferometry, Photoresist materials, Immersion lithography, Neodymium, Fluid dynamics, Absorption

PROCEEDINGS ARTICLE | March 21, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Refractive index, Prisms, Transparency, Interferometers, Chemical species, Molecules, Immersion lithography, Fluorine, Semiconducting wafers, Liquids

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Transparency, Etching, Polymers, Resistance, Photoresist materials, Polymerization, Fluorine, Virtual colonoscopy, Absorption

Showing 5 of 29 publications
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